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SUPRIJADI

Institut Teknologi Bandung S2 - Sains Komputasi SINTA ID : 6033957
3.272
SINTA Score Overall
445
SINTA Score 3Yr
3.272
Affil Score
445
Affil Score 3Yr
METODE PEMBUATAN NANOPATTERN PADA PERMUKAAN SUBSTRAT POLYDIMETHYLSILOXANE MENGGUNAKAN CETAKAN SILIKON HASIL FABRIKASI DENGAN FOCUSED ION BEAM
Inventor : Anggraini Barlian,Candrani Khoirinaya,Damar Rastri Adhika,Suprijadi Haryono Institut Teknologi Bandung
2020 Nomor Permohonan : P00202010529 Status : TERDAFTAR Paten
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Summary

Article Quartile
Research Output
  Scopus GScholar WOS
Article 125 107 42
Citation 864 808 208
Cited Document 98 78 27
H-Index 14 15 7
i10-Index 26 20 4
G-Index 1 1 1
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