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SUPRIJADI

Institut Teknologi Bandung S2 - Sains Komputasi SINTA ID : 6033957
3.018
SINTA Score Overall
456
SINTA Score 3Yr
3.018
Affil Score
456
Affil Score 3Yr
METODE PEMBUATAN NANOPATTERN PADA PERMUKAAN SUBSTRAT POLYDIMETHYLSILOXANE MENGGUNAKAN CETAKAN SILIKON HASIL FABRIKASI DENGAN FOCUSED ION BEAM
Inventor : Anggraini Barlian,Candrani Khoirinaya,Damar Rastri Adhika,Suprijadi Haryono Institut Teknologi Bandung
2020 Nomor Permohonan : P00202010529 Status : TERDAFTAR Paten
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Summary

Article Quartile
Research Output
  Scopus GScholar WOS
Article 117 77 42
Citation 681 500 208
Cited Document 83 47 27
H-Index 13 10 7
i10-Index 21 11 4
G-Index 1 2 1
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