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TOTO WINATA

Institut Teknologi Bandung S2 - Fisika SINTA ID : 6034166
2.548
SINTA Score Overall
373
SINTA Score 3Yr
2.548
Affil Score
373
Affil Score 3Yr
Sistem Reaktor Ganda PECVD Untuk Penumbuhan Lapisan Tipis Material Silikon Amort (a-Si)
Inventor : Toto Winata INSTITUT TEKNOLOGI BANDUNG
2000 Nomor Permohonan : P20000201 Status : Paten
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Summary

Article Quartile
Research Output
  Scopus GScholar WOS
Article 76 161 58
Citation 450 576 276
Cited Document 60 85 42
H-Index 11 11 9
i10-Index 12 12 9
G-Index 1 1 1
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